增强型Cascode结构GaN HEMT器件中子辐照效应研究

Study on neutron irradiation effects of enhancement-mode Cascode-structured GaN HEMT devices

  • 摘要: 为探究增强型共源共栅(Cascode)结构GaN HEMT器件的中子辐照效应及机理,首先利用归一化能量为1 MeV、注量为1×1014 n/cm2的中子源开展辐照效应试验,并对辐照前/后器件的电学特性进行测试,结果表明,经过中子辐照后,器件的阈值电压发生明显的负向漂移,且跨导峰值减小。后续又分别对器件中级联的增强型Si MOSFET和耗尽型GaN HEMT开展Geant4能量沉积仿真和TCAD辐照损伤仿真,结果表明,增强型Si MOSFET的能损和电学性能退化较为严重。其原因是:中子辐照对器件造成位移损伤,且产生的次级重核对器件造成电离损伤,引起Si/SiO2交界处电场强度上升及内部载流子浓度降低,从而导致阈值电压负漂及饱和漏极电流下降。研究结果可为增强型Cascode结构GaN HEMT器件在辐射环境下的应用提供理论参考。

     

    Abstract: The neutron irradiation effects and mechanisms of enhancement-mode Cascode-structured GaN HEMT devices were investigated using neutrons with a normalized energy of 1 MeV and a flux of 1×1014 n/cm2. The electrical characteristics of the device before and after the irradiation were tested. It is found that after neutron irradiation, the threshold voltage of the device undergoes a significant negative drift, and the transconductance peak value decreases. Subsequently, Geant4 energy deposition and TCAD irradiation damage simulations were carried out for the enhancement-mode Si MOSFETs and the depletion-mode GaN HEMTs cascaded in the device, respectively. The results show that the energy loss and electrical performance degradation of the enhancement-mode Si MOSFET device are more serious. The reason is that the displacement damage to the device caused by neutron irradiation, and the ionization damage to the device caused by the secondary re-core lead to an increase in the electric field strength at the Si/SiO2 interface and a decrease in the internal carrier concentration. Therefore, the threshold voltage drifts negatively, and the saturated drain current drops. The proposed research may provide theoretical reference for the application of enhancement-mode Cascode-structured GaN HEMT devices in irradiation environment.

     

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