Abstract: Compared with the development of chip design and manufacturing of monolithic microwave integrated circuits (MMIC), the research on testing and failure analysis of chips has been progressing slowly. This paper introduces the principle of two-dimensional magnetic field imaging with high spatial resolution based on diamond nitrogen-vacancy (NV) color center and the application of diamond NV color center magnetic imaging technology. It also reviews the basic methods of hot-state reliability research for chips and the drawbacks of existing methods. On this basis, the paper discusses the potential advantages of MMIC hot-state reliability research based on diamond NV color center ensembles using microwave magnetic field imaging technology. As technology advances, diamond NV color center-based microwave magnetic field imaging technology is expected to provide reliable diagnostics for chip design, production, and testing.